Zinc oxide holds considerable promise as an optical
transparent conducting material due to its wide band
gap (~ 3.3eV), its amenability to defect or impurity
doping, and other desirable properties such as low cost
and non-toxicity [1]. Thin films of transparent conducting
zinc oxide have been prepared by a wide variety
of techniques, including reactive evaporation [2, 3],
r.f. sputtering, d.c. and ion beam sputtering [4-10],
chemical vapour deposition [ 11-14] and spray pyrolysis
[15-20]
Zinc oxide holds considerable promise as an opticaltransparent conducting material due to its wide bandgap (~ 3.3eV), its amenability to defect or impuritydoping, and other desirable properties such as low costand non-toxicity [1]. Thin films of transparent conductingzinc oxide have been prepared by a wide varietyof techniques, including reactive evaporation [2, 3],r.f. sputtering, d.c. and ion beam sputtering [4-10],chemical vapour deposition [ 11-14] and spray pyrolysis[15-20]
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Zinc oxide holds considerable Promise as an Optical
Material Due to its transparent conducting band Wide
Gap (~ 3.3eV), its Amenability to defect or impurity
doping, and Other desirable properties such as low cost
and non-toxicity [1]. Films of transparent conducting thin
zinc oxide have been prepared by a Wide Variety
of Techniques, including reactive evaporation [2, 3],
RF sputtering, DC sputtering and ion Beam [4-10],
Chemical vapor deposition [11-14] and Spray. pyrolysis
[15-20]
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Zinc oxide holds considerable promise as an optical
transparent conducting material due to its wide band
gap (~ 3.3eV),. Its amenability to defect or impurity
doping and other, desirable properties such as low cost
and 1 non-toxicity []. Thin. Films of transparent conducting
zinc oxide have been prepared by a wide variety
of techniques including reactive, evaporation. [],
, 2 3 r.f. Sputtering D.C,.And ion beam sputtering [4-10],
chemical vapour deposition [] and 11-14 spray pyrolysis
[15-20]
.
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